Polymorphous silicon film was selected to be thermal-resistance layer of micro-bolometer, and we optimized the structure of micro-bolometer through optical and thermal design.
选定多形硅薄膜为微测辐射热计热敏层，并重点从光学和热学两方面对微测辐射热计结构进行了优化设计。
Polymorphous silicon film was selected to be thermal-resistance layer of micro-bolometer, and we optimized the structure of micro-bolometer through optical and thermal design.
选定多形硅薄膜为微测辐射热计热敏层，并重点从光学和热学两方面对微测辐射热计结构进行了优化设计。
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