High-voltage (HV) discharge phenomena, which appear in the working process of electron beam bombarding furnace (EBBF), may result in failure of HV silicon rectifier stack (SRS) in the worst cases.
电子束轰击炉运行过程会产生高压放电现象，严重时可能损坏高压整流硅堆。
Pulse compressed gratings (PCG) used in chirped-pulse amplification system and based on multi-layer thin film stack are etched with ion-beam and holographic techniques.
应用于啁啾脉冲放大技术中的脉宽压缩光栅是基于多层膜作为基底，利用全息干涉技术和离子束技术刻蚀而成。
Pulse compressed gratings (PCG) used in chirped-pulse amplification system and based on multi-layer thin film stack are etched with ion-beam and holographic techniques.
应用于啁啾脉冲放大技术中的脉宽压缩光栅是基于多层膜作为基底，利用全息干涉技术和离子束技术刻蚀而成。
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