Electron beam lithography machine is the key instrument for mask making and research of nanometer device.
电子束曝光技术是掩模版制作和纳米器件研究的主要手段。
In this paper, a unique hoisting structure of laser positioning stage system for electron-beam lithography machine is described.
本文介绍了电子束曝光机激光定位工作台的一种新型吊装结构。
The laser Positioning stage system with hoisting structure which is being developed is the main part of the Electron - beam Lithography Machine.
正在研制的激光定位吊装结构工作台系统是电子束曝光机的主要组成部分。
Based on the SDS-3 E-beam lithography machine, the electrostatic deflection of the folded plate structure was used instead of the electrostatic deflection of the plate.
以SDS - 3电子束曝光机为基础，用折板结构静电偏转替代直板结构静电偏转，探讨了电子束曝光机折板静电偏转场的电子轨迹与电位分布应满足的要求。
Based on the SDS-3 E-beam lithography machine, the electrostatic deflection of the folded plate structure was used instead of the electrostatic deflection of the plate.
以SDS - 3电子束曝光机为基础，用折板结构静电偏转替代直板结构静电偏转，探讨了电子束曝光机折板静电偏转场的电子轨迹与电位分布应满足的要求。
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