Refers to ane-beam evaporator or exposure system.
指电子束蒸发器或曝光系统。
But if we wereto go next door and use a reactive sputterer instead of this e-beam evaporator, we could easily get a coating that forms to the surface, and you wouldn't seeany differences.
但是如果我们利用反射性溅射反应器代替电子束发生器,我们可以很容易的在物体的表面得到这种涂层,你不会看到任何的差异。
But if we wereto go next door and use a reactive sputterer instead of this e-beam evaporator, we could easily get a coating that forms to the surface, and you wouldn't seeany differences.
但是如果我们利用反射性溅射反应器代替电子束发生器,我们可以很容易的在物体的表面得到这种涂层,你不会看到任何的差异。
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