Fabrication of nanostructures is an important part of nanotechnology, and atom lithography technology is a new nanostructure fabrication method.
纳米结构制作是纳米技术的重要组成部分，原子光刻技术是纳米图形制作的一项新方法。
Then some potential applications of atomic lens in the atomic microscopy, atomic microprobe, atom lithography as well as fabrication of grating are discussed.
其次，讨论了原子透镜在原子显微镜、原子探针、原子刻印、光栅制作等领域中的应用前景。
Three solutions of optimization of experimental parameters, adding beam mask and using etching technologies for improving atom lithography quality are presented.
提出了优化实验参数、增加束掩模和利用刻蚀技术三种改善原子光刻实验的方法。
It can make up the shortage that only the periodic dots or lines can be made when using laser standing wave field to control the atoms to stack on wafer in atom lithography.
弥补了原子光刻技术中利用激光驻波场控制原子堆积只能制作单一量子点、线等周期性图形的不足。
Atom hologram lithography employs binary computer generated hologram to handle atoms for making microstructure.
原子全息光刻即采用二元计算全息片掩模来操纵原子，实现微细结构的制作。
Atom hologram lithography employs binary computer generated hologram to handle atoms for making microstructure.
原子全息光刻即采用二元计算全息片掩模来操纵原子，实现微细结构的制作。
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