• In argon (ar) gas, nanocrystalline silicon films are prepared by pulsed laser ablation. The influence of ambient pressure on surface morphology of nanocrystalline silicon film is studied.

    采用脉冲激光烧蚀技术氩气环境制备了纳米薄膜研究了环境气体压强纳米硅薄膜表面形貌影响

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  • The decarburization speeds up, as the ar blow rate increases, and the influence of argon flow rate on decarburization is greater in the low carbon zone.

    随底吹氩气流量增加脱碳速度加大,此种作用影响尤为明显。

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  • The decarburization speeds up, as the ar blow rate increases, and the influence of argon flow rate on decarburization is greater in the low carbon zone.

    随底吹氩气流量增加脱碳速度加大,此种作用影响尤为明显。

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