The projection electron beam lithography with angular limitation(PEBL)is potentially one of the most attractive techniques for nano lithography in the21st Century.
具有角度限制的电子束投影曝光技术有可能成为21世纪最有潜力的纳米光刻技术之一。
Mask fabrication is a key technique of scattering with angular limitation projection electron-beam lithography (SCALPEL).
掩模制作是电子束散射角限制投影光刻(SCALPEL)的关键技术。
The cranking term breaks the time reversal symmetry, and the projection of the single particle angular momentum on the intrinsic symmetric axis is no longer a good quantum number.
推转项的引入破坏了时间反演对称性，单粒子角动量在内禀对称轴上的投影量子数已不再是好量子数。
The cranking term breaks the time reversal symmetry, and the projection of the single particle angular momentum on the intrinsic symmetric axis is no longer a good quantum number.
推转项的引入破坏了时间反演对称性，单粒子角动量在内禀对称轴上的投影量子数已不再是好量子数。
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