A novel alignment system is presented for lithographic apparatus.
提出了一种用于光刻装置的对准系统。
A method of calibrating a lithographic apparatus, an alignment method, a computer program, a lithographic apparatus and a device manufacturing method.
校准光刻装置的方法，对准方法，计算机程序，光刻装置和器件制造方法。
A method of calibrating a lithographic apparatus, an alignment method, a computer program, a lithographic apparatus and a device manufacturing method.
校准光刻装置的方法，对准方法，计算机程序，光刻装置和器件制造方法。
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