该镀层结构为非晶态或混晶态。
The structure of the coating is amorphous or semicrystalline.
非晶态金属是新型的金属材料。
非晶态基本保留了液态的结构特征。
The amorphous has the basic characters of structure of the molten state.
合金镀层常温下为非晶态。
近几年来，对非晶态半导体的研究极为活跃。
In recent years, there has been an extremely active study of amorphous semiconductors.
最后对对非晶态碳膜的应用前景进行了讨论。
Finally, the applications of the amorphous carbon film are discussed.
结果发现，镀铝层的表面层存在非晶态金属相。
The amorphous phase is found in the outer layer of hot-dip aluminized layer.
射线衍射分析结果显示出镀层为一种非晶态结构。
X ray diffraction analysis showed that the layer is an amorphous structure.
本文所要介绍的是有关非晶态光存储薄膜的物理基础。
In this paper the physical basis of amorphous thin films for optical storage has been presented.
钛基非晶态钎焊料是一种较有应用前景的新型钎焊材料。
Ti-based amorphous brazing material is a new brazing material with great application prospect.
陶瓷喷嘴是制取非晶态金属薄带快淬装置的关键部件之一。
Ceramic nozzle is one of the key parts in rapid quenching installation for producing amorphous metal ribbon.
光伏电池依赖于非晶态或晶态的硅，碲化镉或者硒化、硫化铜铟。
Photovoltaic cells rely on amorphous or crystalline silicon, cadmium telluride, or copper indium selenide and sulfide.
本实验通过控制镀液组成和操作条件获得了非晶态铁-铬合金镀层。
The amorphous Fe Cr alloy coatings were obtained by controlling the composition of bath operation conditions.
本实验通过控制镀液组成和操作条件获得了非晶态铁-铬合金镀层。
Fe Cr alloy coatings were obtained by controlling the composition of bath operation conditions.
从理论上计算了非晶态薄带中不同区域的内应力场和应力磁各向导性。
The internal stress fields and the stress-magnetic anisotropies in different regions of the amorphous ribbon were calculated theoretically.
显微硬度测试表明，对相同成分合金，非晶态的显微硬度值比晶态的低。
The microhardness value of the amorphous alloy is lower than that of the crystalline alloy with the same composition.
本文从非晶态物理的角度，综述了非晶态软磁材料的结构与磁性能的物理基础。
This paper overviews the physical base of the structure and properties of amorphous soft magnetic materials based on amorphous state physics.
通过镀覆工艺参数的调节，控制复合镀层基体结构，促使其逐渐向非晶态过渡。
The matrix of composite coatings is turned into amorphous structure again after some technologic factors are adjusted.
随热处理温度的提高或时间的延长，薄膜由非晶态逐渐转化为良好的晶态薄膜。
The films gradate from noncrystalline to crystalline along with the increase of heat treatment temperature and time.
通过对非晶态样品的热分析，确定了它的晶化温度、玻璃转变温度和低温弛豫温度。
The thermal analysis was used to determine the crystallization temperature, the glass transformation temperature and low temperature relaxation temperature of the amorphous samples.
玻璃，根据定义，是无定形、非晶态的；它的原子排布缺乏规律性，排列在各个方向上。
Glass, by definition, is amorphous; its atoms lack order and are arranged every which way.
第二个氧化峰是硫酸铋膜底层铋的二次氧化，其产物为非晶态的铋的氧化物或水合物。
The second oxidation peak is the second oxidation of bismuth under the bismuth sulphate film. The oxidation product is non-crystalline.
高温抗渗碳红外釉料是一种非晶态结构的高温、抗渗碳、耐腐蚀的新型红外辐射材料。
The high temperature anti-cementite infrared glaze is a new type of high temperature anti-cementite and corrosion resistant infrared radiative material with non-crystal structure.
非晶态WO_3薄膜具有优良的电致变色特性，被认为是最有发展前景的功能材料之一。
WO_3 is probably the most promising one of various electrochromic materials due to its excellent electrochromic properties, especially the amorphous tungsten oxide films.
本文中分析了非过渡金属非晶态超导体的超导参量、声子谱参量与霍耳系数之间的经验关系。
In this work, the empirical dependances of superconducting parameters and phonon spectrum parameters on the Hall Coefficient, and the problem on the Tc in amorphous non-transition metals are studied.
探讨如何用电子回旋共振化学气相沉积(ECRCVD)设备制备非晶态氮化硅介质膜和光学膜。
This article is about how to use Electron Cyclotron Resonance Chemical Vapor Deposition (ECRCVD) method to prepare amorphous silicon nitride (SiN_x) film.
实验结果表明：煅烧产物由煅烧前的晶态转变成了非晶态，煅烧温度对煅烧产物的结构有一定影响。
The results show that the calcined kaolin has been transformed from crystallized kaolin to non-crystal one, and calcinate temperature has some influence on its structure.
同时表面硬度高，经热处理后，其镀层表面形成非晶态和晶态的混合物时，硬度可达1200HV。
Meanwhile, high surface hardness after heat treatment, the coating surface formed into the amorphous and crystalline mixture, the hardness is up to 1200hv.
本文介绍了新型电子薄膜材料非晶态硅的特性，制作方法以及利用非晶态硅薄膜各种特性的应用器件。
The properties and preparation techniques are described of a new electronic material - amorphous Silicon film. The practical devices based on various properties of the film are presented.
本文介绍了新型电子薄膜材料非晶态硅的特性，制作方法以及利用非晶态硅薄膜各种特性的应用器件。
The properties and preparation techniques are described of a new electronic material - amorphous Silicon film. The practical devices based on various properties of the film are presented.
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