本文以丙烯酸和F - 44环氧树脂为原料，合成了一种既含有环氧基又含有丙烯酸基的光敏酚醛环氧丙烯酸酯树脂。
The title photosensitive phenolic epoxy acrylate resin has been prepared based on acrylic acid and F-44 epoxy resin as basic materials, which contains epoxy as well as acrylic groups.
本文以丙烯酸和F - 44环氧树脂为原料，合成了一种既含有环氧基又含有丙烯酸基的光敏酚醛环氧丙烯酸酯树脂。
The title photosensitive phenolic epoxy acrylate resin has been prepared based on acrylic acid and F-44 epoxy resin as basic materials, which contains epoxy as well as acrylic groups.
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