本文利用严格耦合波理论对用于光纤光栅制作的相位掩模的衍射特性进行了深入的研究。
The diffraction characteristics of the phase mask for UV-written fiber grating is investigated using rigorous coupled-wave theory.
基于基尔霍夫标量衍射理论，采用光线追迹法设计了连续型平面衍射聚光透镜掩模。
According to Kirchhoff's scalar diffraction theory, with the ray tracing method, a continuous relief mask for diffractive focus lens has been designed.
讨论了制作适用于近场集成光学头中的凸形、凹形微透镜和折衍射复合微透镜的灰度掩模技术。
The applications of gray scale mask technique in the fabrication of convex and concave microlens and hybrid refraction diffraction microlens are discussed.
通过灰度掩模平面不同位置处提供可变的透过率，经一次光刻后得到所需的衍射光学元件。
A variable transmittance is provided to different position on grayscale mask plane and the required diffractive optical elements can be obtained after one-time exposure.
对深入理解和认识接近式深度光刻机的掩模-硅片间衍射的物理本质提供了更为方便的研究手段。
It provides more convenient research means for understand the physical essence of diffraction between mask and wafer of proximity deep stepper.
对深入理解和认识接近式深度光刻机的掩模-硅片间衍射的物理本质提供了更为方便的研究手段。
It provides more convenient research means for understand the physical essence of diffraction between mask and wafer of proximity deep stepper.
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