并对系统进行了X -射线分析，探讨了用x -射线衍射峰强度计算各物相含量的方法。
XRD analysis is discussed on this system, and a method of calculation content of phase content in by X ray diffraction peak intensity is researched.
同时，还观察到了代表梯形聚合物形成的(101)峰，其衍射强度随温度升高而加强。
Meanwhile, the peak (101) at which the ladder polymer was formed showed that the diffraction intensity became stronger as the temperature rised.
随H_2O_2用量增加，衍射峰的强度总体增强；
Increased H2O2 addition causes an increase in HAp XRD diffraction intensity.
但晶胞常数，衍射峰的数目和强度却发生了变化。
But cell constant, diffraction site and intensities have been changed.
提出了应用非晶强度曲线和多重峰分离程序，根据X射线衍射图进行4A分子筛结晶度测定的方法。
A method for the measurement of crystallinity of Zeolite 4a is presented. This method USES an amorphous intensity curve and multiple peaks separation program based on XRD pattern.
提出一个利用多层膜小角X射线衍射谱衍射峰积分强度计算多层膜界面粗糙度的公式。
A simple formula for calculating the interfacial roughness of multilayer by using the small Angle X ray diffraction curves of the samples is given.
从双晶衍射半峰宽值可以评估硅片的抗弯强度。
By the halfwidth of rocking curve we can estimate the bending stress of silicon wafer.
从双晶衍射半峰宽值可以评估硅片的抗弯强度。
By the halfwidth of rocking curve we can estimate the bending stress of silicon wafer.
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