在微波等离子体化学气相沉积装置中，研究了负偏压形核对金刚石薄膜与WC 6 %硬质合金刀具附着力的影响。
The influence of bias enhanced nucleation(BEN) to the adhesion between diamond coating and WC-6%Co carbide cutting tool is researched with the microwave plasma (CVD) instrument.
提高金刚石薄膜与硬质合金基底之间的附着力是CVD金刚石薄膜刀具得以推广应用的关键因素。
To extend the applications of CVD diamond coated tools, the improvement of adhesion between the diamond film and cemented carbide substrate is a key factor.
论述薄膜生长过程中影响薄膜附着力的各种因素，针对其相关因素作了具体的理论分析。
The different kinds of factors which affect the adhesion of the film in its coating are described and analyzed.
提高金刚石薄膜与铜衬底附着力的关键是减小沉积结束后降温过程中产生的膜基热应力和提高膜基间化学键结合。
Reducing the thermal stress between film and substrate during the descent temperature process and improving chemical bonds combination is a key problem to enhance thee adhesion.
金刚石薄膜与硬质合金基体间的附着力较低一直制约着金刚石薄膜涂层工具的商业化生产和大规模应用。
The commercial production and applications of diamond coating tools a re always restricted by the poor adhesion power between diamond coatings and cemented carbide substrates.
正是这些化合物形成的化学结合提高了金刚石薄膜和铜衬底间的附着力。
Chemical bonds combination because of the existence of such kinds of compounds could greatly improve the adhesion property.
硬质合金是一种广泛使用的工具材料，在其表面沉积高附着力的金刚石薄膜时存在着困难。
Cemented carbide is a widely used material for cutting tools, but depositing diamond film onto the surface of the cemented carbide with strong adhesion is very difficult.
以所合成的石墨烯溶胶为原料，经过LBL法自组装得到厚度均匀、表面平整、附着力强的薄膜。
Afterwards, we use the grapheme suspensions as the raw materials, and get the film through LBL methods, with the feature of uniform thickness, smooth surface and high adhesion.
本发明使得真空镀铝薄膜的铝层附着力测量实现了标准化，方便生产厂家对真空镀铝薄膜进行质量控制。
The aluminum layer adhesive force measuring of the aluminum plating thin film is realized standardization by this invention, so manufacturer can control vacuum aluminum plating thin film quality.
本发明使得真空镀铝薄膜的铝层附着力测量实现了标准化，方便生产厂家对真空镀铝薄膜进行质量控制。
The aluminum layer adhesive force measuring of the aluminum plating thin film is realized standardization by this invention, so manufacturer can control vacuum aluminum plating thin film quality.
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