同时获得高去除率和超光滑平整的表面是硬盘磁头自由磨粒抛光的矛盾，研究自由磨粒抛光材料去除规律可以优化抛光工艺。
It is a contradiction to achieve a high material removal rate and a super smooth surface in lapping of magnetic head.
而在游离磨粒加工中，磨粒是完全自由的，处于无约束状态。
The particle restriction of the Semi-fixed abrasive plate is between free completely and fixed completely.
而在游离磨粒加工中，磨粒是完全自由的，处于无约束状态。
The particle restriction of the Semi-fixed abrasive plate is between free completely and fixed completely.
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