通过卷绕式连续真空镀膜膜厚测量的实例，证明效果良好。
Its practical application in measurement of films formed by winding and continuous vacuum film deposition shows that this method is effective.
光干涉膜厚测量技术的测量结果表明，外向流动区域高度随时间的变化与本文的分析相吻合。
The result of the height measurement of the outward region using optical interference technique exhibits a consistency with the analysis in this work.
文中还对多层膜的膜厚测量、X射线双晶衍射实验以及扫描电镜的表面象和剖面象进行了分析。
Film thickness measurements, bicrystal X-ray diffraction experiments and surface and cross-sectional micro-photographs taken by S. E. M. for epitaxial films are also discussed.
通过制备掺铝氧化锌(ZAO)薄膜及SEM断口观察进行实验验证，证实该修正方法有助于提高膜厚测量精度。
The experiment of measuring the thickness of ZAO film and SEM fracture inspection proves that the method of correction is useful to improve the measurement precision.
本文介绍了几种主要的膜厚测量仪器以及这些仪器的校准检测方法，并着重介绍了校准用膜厚标准的制定及应用。
This paper describes several main film thickness measurement tools with focus on the development and application of film thickness standard materials for calibration purposes.
为了弥补目前采用的各种镀层厚度测量方法之不足，本文提出利用镀层元素一次X光激发的基底金属二次荧光进行膜厚测量的设想，并推导出相应的计算公式。
A suggestion was made to measure thin-film thicknesses using second X-ray fluorescence from substrate excited by primary X-ray of plating element, and corresponding equations were derived.
我们利用这种方法测量了所研制的KT P光波导薄膜层的折射率和膜厚。
We have used such methods to measure the thickness and refractive index of the film layer of KTP waveguide.
在离子束溅射镀膜机的膜厚控制系统的研究中，由于采用了现代检测手段，使测量精度大大提高。
In the research of the membrane thickness control system of IBS plating machine, as having adopted modern detection means, measure precision improves greatly.
最后给出的实验结果表明利用该原理测量膜厚是可行的。
The tested result shows that the measurement of film thickness by the principle is feasible.
通常采用的膜厚光学测量法只能给出透明材料的线性厚度，而不能对非透明材料进行厚度测量，也不能直接给出被测材料的质量厚度。
Commonly, the optical film thickness measurement method is only used for linear transparent material thickness measurement, and can also not directly measure the thickness of material's quality.
通过测量由约200个单层构成的多层结构的光谱特性，证实了良好的膜厚精确度和过程稳定性。
The high thickness accuracy and process stability are exemplified by the measured spectral performance of multilayer stacks with about 200 single layers.
在超高真空系统中测量了不同膜厚样品的场发射特性，发现阈值电场随着厚度的增加有增大的趋势。
X-ray diffraction indicates that the prepared films are AlN films. The field emission characteristics of the AlN films were measured in an ultra-high vacuum system.
从最大的膜厚刻度值开始，减少由于表面张力导致测量不准确的风险。
Begin at maximum thickness to reduce risk of inaccuracy caused by surface tension.
从最大的膜厚刻度值开始，减少由于表面张力导致测量不准确的风险。
Begin at maximum thickness to reduce risk of inaccuracy caused by surface tension.
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