在整套工艺环节中，光掩模版图设计和湿法腐蚀是两个关键步骤。

The mask design and the wet etching are both key processes in the technology introduced.

youdao

在整套工艺环节中，光掩模版图设计和湿法腐蚀是两个关键步骤。

The mask design and the wet etching are both key processes in the technology introduced.

youdao