第三章研究了用脉冲电化学腐蚀制备均匀发光多孔硅。
In the third chapter Porous silicon was prepared by pulsed and dc electrochemical etching methods under the equivalent etching condition.
脉冲镍镀层具有较佳的电化学腐蚀特性和对铀基体更好的防腐蚀性能。
The electrochemical corrosion characteristics and resistant performance of pulse plated nickel deposit for uranium substrate is better than DC deposit.
脉冲镍镀层具有较佳的电化学腐蚀特性和对铀基体更好的防腐蚀性能。
The electrochemical corrosion characteristics and resistant performance of pulse plated nickel deposit for uranium substrate is better than DC deposit.
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