STO薄膜采用脉冲激光沉积法(PLD)制备。
型半导体氧化锌薄膜，其制备方法，和使用透明基片的脉冲激光沉积方法。
P-type semiconductor zinc oxide films, process for preparation thereof, and pulsed laser deposition method using transparent substrates.
以烧结B4C为靶材料、在氮离子束辅助下用脉冲激光沉积方法制备了三元化合物硼碳氮(BCN)薄膜。
Using sintered B4C as target material, ternary BCN thin films were synthesized by means of pulsed laser deposition assisted by nitrogen ion beam.
脉冲激光沉积是近年来出现的一项制备薄膜的新技术，在制备生物活性陶瓷涂层方面显示出独特的优越性。
Pulsed laser deposition is a new technique for producing thin film in the recent years. It shows the unique advantages for the deposition of bioactive ceramic.
多种工艺可以用来制备透明导电薄膜，如磁控溅射真空反应蒸发、化学气相沉积、溶胶-凝胶法以及脉冲激光沉积等。
Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, Sol-gel, laser-pulsed deposition.
本文采用射频辅助脉冲激光沉积(PLD)系统，在镀有透明导电膜氧化锡铟(ito)的玻璃衬底上制备了氧化锌薄膜。
Zinc oxide thin films were prepared by pulsed laser deposition (PLD) on glass substrates coated with tin-doped indium oxide (ITO) thin films in this paper.
薄膜材料已在徽电子元件、超导材料、生物材料等方面得到广泛应用，为了得到高质量的薄膜材料，脉冲激光沉积技术受到了广泛的关注。
Thin film materials have been widely used in micro electronics, superconductor, and bioceramics materials. In order to obtain high quality thin films, deposition have attracted more attention.
本文首先介绍了脉冲激光蒸发沉积以及真空弧沉积技术，在此基础上对激光真空弧技术的原理、特点、研究现状及应用进行了文献综述。
Based on the introduction of pulsed film deposition and vacuum arc technique, the principles, characters, research developments and applications of laser-arc technique are presented.
该实验方法说明，利用脉冲激光与金属掺杂靶相互作用沉积梯度金属薄膜是可行的。
This experimental method indicates that it is feasible to deposit functional gradient metal thin films by means of the interaction between pulsed laser and metal doping target.
利用脉冲激光溅射沉积pzt压电陶瓷薄膜。
This paper reports an investigation on PZT films by pulsed laser deposition.
脉冲激光薄膜沉积（PLD）是近年来受到普遍关注的制膜新技术。
The pulsed laser deposition (PLD) is a new promising technique for the growth of thin films attended generally by people recently.
超短脉冲激光照射固体靶时可将其能量在极短的时间内沉积在靶表面一个极小的空间范围内，在固体靶表面产生固体密度的等离子体。
Differing from the long pulse laser the ultra short laser will deposit its energy on the surface of the solid target in very short time and produce solid dense plasmas.
超短脉冲激光照射固体靶时可将其能量在极短的时间内沉积在靶表面一个极小的空间范围内，在固体靶表面产生固体密度的等离子体。
Differing from the long pulse laser the ultra short laser will deposit its energy on the surface of the solid target in very short time and produce solid dense plasmas.
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