认为晶闸管整流桥电镀电源需具有等于或小于4.18%的纹波因数值才能满足一些氧化和电镀工艺的要求。
Thyristor power supply with ripple percentage equal to or less than 4.18% is suggested to meet anodizing and electroplating processes requirements.
实验结果表明，应用该电路拓扑的实验装置，其功率因数较高，输入电流的总谐波畸变较低，输出电压纹波小，而且整个装置的效率也比较高。
Experiment result showed, the topology can make the device get to high Power Factor (PF), low Total Harmonic Distortion (THD) of input current, low ripple of output voltage, and high efficiency.
通过实验结果表明，单级功率因数校正装置可以实现较高的功率因数、较低的总谐波畸变，而且输出电压纹波小。
Experiment results showed that the correction device of power factor could realize high power factor, low harmonic distortion and low ripple of output voltage.
通过实验结果表明，单级功率因数校正装置可以实现较高的功率因数、较低的总谐波畸变，而且输出电压纹波小。
Experiment results showed that the correction device of power factor could realize high power factor, low harmonic distortion and low ripple of output voltage.
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