成功地用该设备制备出类金刚石薄膜。
标签类金刚石薄膜红外界面。
最后，简要说明了非晶碳类金刚石膜应用情况。
Finally, the application of DLC films was introduced briefly.
本文给出了华北光电所研究类金刚石薄膜的结果。
We gave the result of the diamond-like films research in the North China Research Institute of Electro-optics.
最后将金刚石薄膜和类金刚石薄膜进行了简单比较。
At the end the comparison between Diamond Coatings and Diamond-like Coatings have been given.
介绍了两种普遍采用的类金刚石（DLC）膜沉积方法。
Two commonly adoptived depositing methods of diamond-like-carbon(DLC) are introduced and analyzed.
类金刚石在高压下保留可得高sp3含量膜的SP3键。
The diamondoid retains SP3 bonds which yields a high SP3 content film at higher pressure.
利用脉冲多弧离子镀技术在硅基底上沉积类金刚石薄膜。
DLC films were prepared on silicon by pulse-arc plasma deposition.
喇曼光谱研究表明，这种薄膜是典型的无氢类金刚石薄膜。
Raman spectrum study shows that the film has typical pikes of hydrogen free diamond like carbon film.
分析了目前类金刚石膜在模具上的应用和推广中存在的障碍。
The problems of applying DLC films in dies were also discussed.
本文介绍了氟化类金刚石膜的结构、性能、应用领域和发展趋势。
Introduces the structure and properties of diamond-like fluorinated carbon film, as well as the fields of its application and developing trend.
本文介绍了氟化类金刚石膜的结构、性能、应用领域和发展趋势。
Introduces the structure and properties of diamond-like fluorinated carbon film, as well as the fields of its application and developing tr...
采用过滤阴极电弧沉积方法有可能制成无宏观粒子的类金刚石薄膜。
It is possible to deposit DLC (Diamond-Like Carbon) without MP by filtered vacuum arc deposition.
阐述了类金刚石膜的力学性能和类金刚石膜工具的应用及研究现状。
The mechanical properties of DLC films and the current status of research and applications in tools are reviewed in this paper.
金刚石膜或类金刚石膜用来作为场发射的阴极，是其极具前景的应用之一。
Using diamond film or diamond-like film as field emission cathode is one of the promising applications.
并论述不同工作参数的激光对类金刚石薄膜的激光破坏行为及其损伤阈值。
Laser induced damage mechanism and the modification of laser irradiation on the structure and characters of DLC were analysed.
为了改善DLC膜的性能，掺金属的类金刚石薄膜从而成为人们研究的重点。
In order to improve these properties of DLC films, metal doped DLC films have been becoming an important topic of people's study.
研制了一套过滤式阴极电弧沉积设备，并利用该设备成功地获得了类金刚石薄膜。
The instrument of filtered cathode arc deposition is successfully built in our laboratory. Diamond-like carbon film is maded.
目的在PM MA树脂义齿表面沉积类金刚石碳(dlc)膜改善义齿的耐磨性能。
Objective To improve the function of the wear-resisting of PMMA resin denture through depositing the film of diamond like carbon (DLC) on the surface.
最后还给出了利用高电荷态离子辐照石墨表面，产生类金刚石结构的相关研究结果。
Last, the investigation on the diamond-like carbon production by impacting of HCI on HOPG surface was presented.
利用分子动力学模拟方法，从原子尺度上研究了类金刚石（DLC）薄膜生长过程。
Molecular dynamics simulations are performed to study the growth of diamond_like carbon (DLC) films on the atomic scale.
分析了类金刚石薄膜的硬度和工艺参数的关系，讨论了薄膜的耐磨性和化学稳定性。
The relationship between hardness of the deposited films and deposition parameters were analysed in detail. Wear resistance and chemical inertness of the deposited films are also studied.
利用新型中频对靶磁控溅射在硅和M2高速钢基体上沉积了一系列无氢含铬类金刚石膜。
The hydrogen-free diamond-like carbon(DLC) films were deposited on substrates of Si and M2 high-speed steel using a new mid-frequency dual-magnetron sputtering.
采用电弧离子镀膜方法，以高纯石墨为碳离子源在PM MA树脂义齿表面沉积类金刚石膜。
By the technology of vacuum cathodic arc deposition, graphite as cathode, Diamond like carbon film (DLC) was deposited on PMMA resin denture.
采用真空磁过滤弧沉积(FAD)的方法制备的类金刚石(DLC)薄膜具有良好的场发射性能。
Diamond -like -carbon (DLC) thin film was prepared by filtered arc deposition (FAD) with a good electron emission performance.
本文采用交替施加高偏压和低偏压的方法，合成出了具有软膜和硬膜结构的无氢类金刚石多层膜。
Using an alternating high- and low-bias voltage, we have formed hydrogen-free multilayers of hard and soft diamond-like carbon films.
探讨了用液相电解沉积法在钛合金表面制备类金刚石薄膜的新方法。讨论了不同沉积条件对膜的影响。
In this paper, Influence of deposition condition on diamond-like carbon(DLC) fil ms byliquid deposition onthe surface of Ti alloy was discussed.
单位面积石墨表面上粘附血小板的数目远大于金刚石膜表面，而纯的类金刚石膜表面上基本没有粘附血小板。
The platelets adhered on the surface of graphite are much more than those on the diamond-film, while on the surface of diamond-like coating, nearly no platelets are founded.
通过控制压力、类金刚石母体的种类和偏置电压，这种新的方法防止了类金刚石母体在撞击基材时完全解体。
By controlling pressure, type of diamondoid precursor and bias voltage, the new method prevents the diamondoid precursor from fully breaking upon impact with the substrate.
通过控制压力、类金刚石母体的种类和偏置电压，这种新的方法防止了类金刚石母体在撞击基材时完全解体。
By controlling pressure, type of diamondoid precursor and bias voltage, the new method prevents the diamondoid precursor from fully breaking upon impact with the substrate.
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