该边缘气体室通过多个气体供应管道连接至一个设置在该基片支撑件内且靠近该基片支撑件中心的中央气体室。
The edge gas plenum is connected to a central gas plenum disposed within and near the center of the substrate support through a plurality of gas supply channels.
该边缘气体室通过多个气体供应管道连接至一个设置在该基片支撑件内且靠近该基片支撑件中心的中央气体室。
The edge gas plenum is connected to a central gas plenum disposed within and near the center of the substrate support through a plurality of gas supply channels.
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