由于等离子体是一种具有很高能量和极高活性的物质，它对于任何有机材料等都具有良好的蚀刻作用，因而在最近几年也被引用到印制电路板制造中来。
The plasma is a high energy and high activity material, it has good etching effect for any organic material, which in recent years has also been referenced to the printed circuit board manufacturing.
由于它的优点，如高蚀刻率、高选择性、无碳蚀刻和最小限度的残留污染，电子工业把它用在等离子和热清洁应用中。
The electronics industry uses it in plasma and thermal cleaning applications for its advantages such as high etch rates, high selectivity, carbon-free etching, and minimal residual contamination.
然而，对一个宽槽来说，由于等离子区内边界层的变形，其蚀刻宽度会随着蚀刻深度的增加而增加。
However, for a wide trench, the width of etched profile will increase with the increase of its depth since the deformation of boundary layer in plasma.
本文提出了用等离子体蚀刻法提高浮雕全息光栅衍射效率的原理和方法。
The principle and method to improve the diffraction efficiency of relief holographic gratings by plasma etch is presented in this paper.
这样等离子体干法蚀刻对氮化镓的电气性能的损伤有显著降低。
The plasma dry etching method is of evidently-reduced damage to the electrical performance of the allium nitride.
这样等离子体干法蚀刻对氮化镓的电气性能的损伤有显著降低。
The plasma dry etching method is of evidently-reduced damage to the electrical performance of the allium nitride.
应用推荐