目前Coskata采用等离子火炬以废木材和类似原料来制造合成气，但改变处理生活垃圾的设备也并太困难。
At the moment Coskata USES a plasma torch to make syngas from waste wood and wood-pulp, but modifying the apparatus to take household waste should not be too hard.
在微波等离子体化学气相沉积装置中，研究了负偏压形核对金刚石薄膜与WC 6 %硬质合金刀具附着力的影响。
The influence of bias enhanced nucleation(BEN) to the adhesion between diamond coating and WC-6%Co carbide cutting tool is researched with the microwave plasma (CVD) instrument.
根据弗吉尼亚州费尔法克斯的一个废物处理咨询机构Gershman,Brickner &Bratton的数据，超过36家其他美国企业正在计划建设等离子体炬合成气工厂。
More than three dozen other American firms are proposing plasma-torch syngas plants, according to Gershman, Brickner &Bratton, a waste consultancy based in Fairfax, Virginia.
提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。
A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.
本文系统研究了石英钟罩式微波等离子体辅助化学气相沉积装置对沉积金刚石薄膜的影响。
In this paper diamond films were deposited using bell-jar type microwave plasma assisted CVD system.
本装置上，等离子体热解天然气制乙炔和炭黑的动力学不是由反应速度控制，而是由混合与扩散控制。
The process of conversion of methane to nana-carbon black and acetylene via thermal Plasma is under the control of mixing and diffusion rate.
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
A series of microcrystalline silicon thin films were fabricated by very high frequency plasma-enhanced chemical vapor deposition at different substrate temperatures (T_s).
通过变换工作气体(氢气和氘气的相互转换)研究了HT - 6m托卡马克中等离子体的再循环。
Recycling in the HT-6M tokamak is studied by changing the working gas from deuterium to hydrogen and vice versa.
设计的微弧等离子喷枪采用了独特的气路结构、喷嘴结构和中心轴向送粉方式；
The micro-plasma spraying gun adopted unique passage and spraying nozzle structure and center axial to be sent the powder method.
提出熔敷焊接工艺方法，采用等离子弧、TIG电弧、高频感应、气保护连续炉、真空炉和模中熔铸工艺实现了熔敷焊接工艺方法。
Re melt deposit welding process is proposed in this paper. To realize the technology, plasma arc, TIG arc, high frequency induction, gas shield continuous stove and MSW are adopted.
若配有等离子电源，则需严格按照等离子电源制造商的要求进行电、气的连接。
If equipped with plasma power had, then need to be in strict accordance with the plasma power supply manufacturer's requirements for electricity, gas connection.
本文介绍了用射频等离子体化学气相沉积的方法，在硅基底上制备得到具有优异性能的非晶态碳膜。
In this paper, the rf plasma deposited method has been reported. On the silicium substratum, the amorphous carbon film with excellent properties have been made.
本文应用气相色谱-微波诱导等离子体发射光谱联用(GC -MIP)方法对氘标记的激素样品经验式进行了测定。
The hyphenated gas Chromatography-microwave induced plasma atomic emission spectrometry (GC-MIP) has been used for the determination of empirical formulae for deuterium labelled hormones.
大电流热阴极辉光放电用于等离子体化学气相沉积金刚石膜，有效地提高了沉积速率和膜品质。
Large current hot cathode glow discharge was used for plasma chemical vapor deposition of diamond films. It improved deposition rate and films quality efficiently.
研究了在热阴极辉光放电等离子体化学气相沉积金刚石膜过程中，热阴极辉光放电特性与金刚石膜沉积工艺的关系。
The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed.
使用该等离子体源以乙醇蒸汽和氢气为气源在石英玻璃管外表面沉积金刚石膜。
Diamond films had been deposited on quartz tube with the gas mixture of ethanol steam and hydrogen by the plasma source.
介绍了渗氮、超低温处理、气相沉积、等离子改性以及复合表面处理技术等在切削刀具中的应用现状和发展趋势。
The status and development trend of surface treatments, such as nitriding, vapor deposition, plasma modification and multiplex surface treatment technology used for cutting tools were described.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
介绍了等离子体化学工艺，特别着重介绍了溅射镀膜与等离子体化学气相沉积在粉末冶金中的应用。
This article introduces processing of plasma chemistry and application of sputter coating and plasma-enhanced chemical vapor deposition in powder metallurgy especially.
利用微波等离子体化学气相沉积(CVD)设备，在硅基片上进行了金刚石薄膜的沉积实验。
The experiment of the deposition of diamond thin films is made on silicon substrate by using microwave plasma chemical vapor deposition (CVD) system.
以镍为催化剂，利用微波等离子体化学气相沉积法制备了弹簧状碳纤维。
Under the catalytic effect of nickel particles, spring-like carbon filaments were synthesized through microwave plasma chemical vapor deposition.
以轴对称非定常欧拉方程为基础，建立了激光推进火箭发动机吸收室内纯气相单组分、以激光等离子体为内热源的流场模型。
A gas flow model with laser plasma as heat source was developed based on axial symmetric Euler equations in the laser propulsion rocket engine absorption chamber.
传统等离子体增强化学气相沉积(PECVD)技术，工艺成熟，制备的薄膜质量高，较适合大规模工业化生产。
For the high technical maturity and the high deposition quality, traditional plasma enhanced chemical vapour deposition (PECVD) technology was wide applied in the large-scale industrial production.
利用微波等离子体化学气相沉积方法，以H 2、CH4和八甲基环四硅氧烷(D4)为原料，在硬质合金基体上沉积了金刚石涂层。
Diamond coatings were deposited on cemented carbide substrates with H2, CH4 and D4 as precursors by using microwave plasma chemical vapor deposition technique.
以镍片为基板材料，利用微波等离子体化学气相沉积法在低温条件下合成了纳米碳管膜。
Carbon nanotube films were synthesized on Ni substrate by microwave plasma chemical vapor deposition at low temperature.
通过对13 -5型马氏体不锈钢焊接接头进行等离子弧清根及碳弧气刨清根的比较，证明等离子弧清根对全焊透焊缝实施背面清根是可行的。
By comparing backgouging of plasma arc with carbon arc to the welded joint of 13-5 martensitic stainless steel, the backgouging of plasma arc is proved feasible for the full penetration weld.
分析了LGK系列空气等离子弧切割机的使用方法，例举了其引弧故障、主电路故障、气路故障、割枪故障产生的原因和解决方法。
This paper analyses the usage of LGK series of air plasma arc cutting machine, and enumerates the causes and solutions of striking arc, main circuit, gas path and cutting torch breakdown.
实验研究等离子体射流共裂解天然气和煤制乙炔。
This thesis is concerning the acetylene produced through co-cracking coal and natural gas by plasma jet.
为快速沉积高品质金刚石膜，建立了热阴极等离子体化学气相沉积方法。
Hot cathode chemical vapor deposition method was established in order to deposit high-quality diamond films with high deposition rate.
为快速沉积高品质金刚石膜，建立了热阴极等离子体化学气相沉积方法。
Hot cathode chemical vapor deposition method was established in order to deposit high-quality diamond films with high deposition rate.
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