等离子体低温刻蚀是一种针对高深宽比结构的干法刻蚀技术。

High aspect ratio structures have been successfully fabricated by plasma cryo-etching on silicon wafers.

youdao

等离子体低温刻蚀是一种针对高深宽比结构的干法刻蚀技术。

High aspect ratio structures have been successfully fabricated by plasma cryo-etching on silicon wafers.

youdao