本文介绍了等离子增强磁控溅射沉积技术。
This article presents an introduction to Plasma enhanced, magnetron sputtered deposition Technology.
等离子增强化学气相沉积(PECVD)是低温沉积硅膜的主要方法。
Plasma enhanced chemical vapor deposition (PECVD) is one of the matured and simple manipulated among the thin film deposition methods at low temperature.
门电介质沉积层使用气体包括一个芯片和含氯化合物的混合物等离子增强沉积。
The gate dielectric layer is deposited using a plasma enhanced deposition with a gas mixture comprising a silicon and chlorine containing compound.
为了满足制备较厚低摩擦系数类金刚石薄膜（DLC）耐磨镀层的实际需求，对在等离子增强化学气相沉积的类金刚石薄膜（W-DLC）中掺钨进行了系统研究。
To meet the requirement for the diamond-like carbon thin films with low friction factor, the tungsten-doped diamond-like carbon(W-DLC)thin films prepared through PECVD were studied in depth.
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
A series of microcrystalline silicon thin films were fabricated by very high frequency plasma-enhanced chemical vapor deposition at different substrate temperatures (T_s).
为解释谱线强度增强的机理，测量了等离子体的激发温度。
The excitation temperature of laser plasma was measured to explain the mechanism that the line intensities increase.
这些纳米粒子呈现的等离子体激元震荡导致玻璃的非线性光学性质增强，因此离子注入的玻璃可以应用于全光学开关器件。
These nanoparticles exhibit plasmon resonance, which enhance the nonlinear optical properties of the glass, so that the implanted glass may be used for all_optical switching devices.
详细介绍了堆焊、激光熔覆、激光熔射、等离子熔化-注射等颗粒增强表层复合材料的制备方法，并分析了各种制备技术的优缺点。
Hardfacing, laser cladding, laser melt injection and plasma melt injection were introduced, and the virtues and defects of all the methods were discussed.
采用四极质谱仪测量了试验参数对高压脉冲增强射频磁控溅射ptfe靶等离子体气氛的影响规律。
Quadrupole mass spectrometer was used to analyze the plasma environment of RF magnetron sputtering PTFE target with pulsed bias.
报道了一种改进型的微波等离子体增强辉光放电(MPEGD)光源，并将这种级联光源用于固体导电样品的分析。
A novel microwave plasma-enhanced glow discharge (MPEGD) lamp was used as excitation source for the analysis of solid samples.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
并且尘埃等离子体层对电磁波的衰减随尘埃粒子浓度以及尘埃粒子半径的增大而明显增强。
The attenuation of the electromagnetic wave from the layers of the dust plasma increases with the increase of density and size of the dust grain.
研究结果表明：用射频等离子体增强化学气相沉积法，可以在PET上沉积厚度为纳米至微米级的非晶碳氢膜。
The results show: the amorphous hydrogenated carbon film can be fabricated on PET surface by plasma-enhanced chemical vapor deposition.
本文基于产业化应用和改善类金刚石膜与基体结合力为目的，在大型工业用等离子体—离子束增强沉积系统中，获得了DLC膜和梯度复合dlc膜。
DLC films and gradient composition DLC films were deposited on si substrates in plasma-ion beam enhanced deposition system for the industrial applications and improving the adhesion.
传统等离子体增强化学气相沉积(PECVD)技术，工艺成熟，制备的薄膜质量高，较适合大规模工业化生产。
For the high technical maturity and the high deposition quality, traditional plasma enhanced chemical vapour deposition (PECVD) technology was wide applied in the large-scale industrial production.
最近的一系列的实验研究表明，在大功率微波器件中填充等离子体可以大大增强其电子束与波的互作用效率，提高功率输出的水平；
Recently, much attention has been made on the study of plasma-filled high-power microwave devices for the enhancement of efficiency and output power.
提高等离子氮流量、增强搅拌、延长精炼时间，钢中含氮量增加。
The results show that increasing the nitrogen rate as plasma arc gas, higher stirring intensity and longer alloying time, the nitrogen content in steel is also increased.
介绍了低温等离子体技术及其特点，论述了低温等离子体技术在改善塑料薄膜印刷适性、提高粘接性及增强PET瓶阻隔性等塑料包装中的应用。
The application of the low temperature plasma technology in improving the printability, increasing the adhesion of plastic film, and enhancing the barrier properties of the PET bottles were discussed.
采用扫描电镜从微观上分析了纤维等离子体处理增强界面结合的机理。
The mechanism of interface combination reinforcement with fiber-plasma treatment was developed by SEM.
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
Microcrystalline silicon thin films prepared at different deposition parameters using very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD).
对电能释放与化学能释放过程的合理匹配表明，等离子体能够增强液体药的燃烧并影响压力变化曲线。
The match between releasing of chemical energy and discharging power of electric energy was analyzed. It is indicated that the plasma could aug…
采用甚高频等离子体增强化学气相沉积技术成功地制备了不同硅烷浓度和辉光功率条件下的微晶硅电池。
Microcrystalline silicon solar cells with the variation of silane concentration (SC) and discharge power were fabricated by very high frequency plasma-enhanced chemical vapor deposition.
采用射频等离子体增强化学气相沉积法(RF - PECVD)在钢衬底上沉积氮化硅薄膜。
Silicon nitride thin films were prepared onto steel substrates by radio-frequency plasma enhanced chemical vapor deposition (RF-PECVD) technique.
设计了一种基于表面等离子体局域增强的高灵敏性全光调制方案，理论分析的结果对于设计新型全光器件具有一定的借鉴意义。
A new sensitive all-optical modulator project on surface plasmon polariton is numerical designed. The theoretically analyses possess the instructive meaning for designing new type all-optical devices.
增强主要是由于金属银粒子与银基底表面的电磁耦合，即银粒子的定域表面等离子体共振与银基底的表面等离子激元间的相互作用。
The enhancement is related to the electromagnetic coupling of the localized surface plasmon resonance of silver metal particles and the surface polariton of the silver substrate.
数值结果表明，等离子体隐身在理论上是有效可行的，合理的设置等离子体参数，可以极大的增强等离子体隐身效果。
Numerical results indicate that plasma stealth is effective in theory and reasonable selection with the plasma parameters can greatly enhance the effectiveness of plasma stealth.
等离子体增强电化学表面陶瓷化(微弧氧化)是一项在有色金属表面原位生长陶瓷膜的新技术。
Plasma enhance electro-chemic al surface ceramic-coating (Microarc oxidation) is a new technique, which can in-situ form the ceramic coatings on the surfaces of some non-ferrous metals.
利用等离子体增强化学气相沉积（PECVD）工艺，在不同射频功率，不同反应气压条件下制备了氮化硅薄膜。
SiN thin films are deposited by plasma enhanced chemical vapor deposition (PECVD) under various power and pressure conditions.
以硅烷和氧化二氮作为反应气体，采用等离子体增强化学气相沉积(PECVD)技术，不使用掺杂，在单晶硅衬底上制备了用于平面光波导的二氧化硅薄膜。
Without doping, plasma enhanced chemical vapor deposition (PECVD) of silica films on si substrates with gas mixtures of SiH_4 and N_2O is considered.
入射光场的增强经由表面等离子体激元极化子共振实现。
An enhancement of the incident optical field is achieved via surface plasmon polariton resonances.
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