照片的左上方是一个日珥，它是一个巨大的等离子体气体环，在这个时候正被抛离太阳。
At the top left of the image there is a solar prominence, a huge loop of plasma, that is being blasted into space.
日冕的电离气体（又叫等离子体）不仅非常炙热，而且异常稀薄，其密度还不到组成太阳主体的氢气密度的十亿分之一。
As well as being very hot, the ionised gas of the corona (called plasma) has a superthin consistency. It is less than a billionth of the density of the hydrogen that makes up the main ball of the Sun.
等离子体——一种有时被称为物质第四状态的电离气体——通常存在于上千摄氏度中，而热等离子体常常被用于外科手术器械的消毒。
Plasma — an ionized gas sometimes called the fourth state of matter — typically exists at thousands of degrees Celsius, and hot plasmas are regularly used to sterilizing surgical equipment.
紫外线成像显示出的绿色漩涡以及可见光形成的图像揭示了氢和硫磺气体的存在，它们受发自四边形的强紫外线的辐射而变热并形成等离子体。
Swirls of green in Hubble's ultraviolet and visible-light view reveal hydrogen and sulfur gas that have been heated and ionized by intense ultraviolet radiation from the Trapezium's stars.
结果表明，等离子体在壁处的反射系数约为0.59，变换工作气体后，在第一次放电的等离子体中，由壁释放的同位素含量约占65％。
The results show that the reflection coefficient near the wall is about 0. 59, and in the plasma of the first discharge after a gas change, the wall-released isotope amount to 65% .
通过变换工作气体(氢气和氘气的相互转换)研究了HT - 6m托卡马克中等离子体的再循环。
Recycling in the HT-6M tokamak is studied by changing the working gas from deuterium to hydrogen and vice versa.
气体放电中的各种等离子体鞘层。
本文简要介绍了在实验室条件下低温等离子体对异(臭)味气体分子的分解作用及其在工业上的应用实例。
The paper presents the decomposition of low temperature plasma upon stench gas molecule under the circumstance of laboratory and its popularizing application in industry.
你需要使用氧气作为处理气体来产生氧气等离子体。
当气体变得异常炽热，电子脱离了原子核，留下一团带电荷的粒子，等离子体就形成了。
Plasma forms when gas becomes so hot that electrons are stripped from atomic nuclei, leaving behind a soup of charged particles.
利用气体放电产生的等离子体朗缪尔流效应来使敏感元件产生一定速度的运动，不需另外的驱动元件。
Plasma Langmuir flow effect produced by gas discharge was used to make sensitive component move at a certain velocity without further drive part.
用该系统检测了仅用CF4作为刻蚀气体刻蚀非晶硅基薄膜的等离子体光发射谱。
The optical emission spectrum of r. f. plasma during amorphous silicon based film etching in CF4 gas is detected.
用低压等离子体技术对气体和液体过滤介质进行处理，可提高过滤介质的质量且可降低生产成本。
The gas and liquid filter media treated by low pressure plasma technology have good quality and low production cost.
在磁流体(MHD)发电中，导电气体(等离子体)直接通过一磁场来产生电压。
In Magneto hydrodynamics (MHD) generation a conductive gas (plasma) is. directed through a magnetic field and a potential is. developed.
采用循环水冷却和循环等离子体工作气体的改进方法，制备出纳米铁粉。
Nanometer iron powder was prepared by utilizing modified the circulating water and plasma gas.
观测证明，（解决这个谜团的）关键是一种叫做针状体的东西，它从太阳的表面向日冕层释放出称为等离子体的高温气体。
The key, it turns out, are called spicules, which vent hot gases, called plasma, from the sun's surface into the corona.
利用低温等离子体技术处理污水厂恶臭气体，是一种新的技术。
It is a new way that low temperature plasma technology is used to treat odor in the waste water plant.
然而考虑到等离子体约束和边界气体再循环，钨涂层面对等离子体材料在真空中的出气性能的研究是十分重要的。
However, in view of plasma confinement and its boundary gas recycling, the investigation on the gas desorption behavior of plasma facing material for tungsten coating is very important.
本文给出非理想流体(非理想气体、等离子体及液体)的对偶关联性质的一般理论。
In this paper, a general theory on correlated properties of fluids (nonideal gases, plasmas and liquids) is studied. The solution operator of BBGKY hierarchy is obtained.
探讨了等离子体处理时间、放电功率、气体压强及接枝单体浓度、接枝反应时间、温度等各因素对接枝率的影响规律。
The influences of the treating time, power, treating pressure of plasma, concentration of monomer, reaction temperature and time on the grafting rate are discussed.
使用光强标定的发射光谱（AOES）测量了CHF3/C6H6混合气体的微波电子回旋共振（ECR）放电等离子体中基团的分布状态。
The distribution of radicals in CHF3/C6H6 electron cyclotron resonance (ECR) plasma was investigated by an actinometric optical emission spectroscopy (AOES).
指出等离子体净化和脉冲电晕放电是净化有害气体的较好方法。
It is pointed out that the plasma cleaning and the pulsed corona discharge are the better methods to get rid of harmful gases.
探讨了电弧等离子体发生器的静态伏安特性以及气体流动状态对等离子体发生器热效率、热焓的影响。
Static characteristics of arc plasma reactor and the influence of flowing gas state on the thermal efficiency and stagnation enthalpy of plasma torch has been investigated.
本发明提供能够在处理基体上形成均匀的薄膜的微波等离子体处理装置和气体供给构件。
A microwave plasma processing device and a gas supply member capable of forming a uniform thin film on a substrate to be processed.
这可以通过若干不同方法完成，但最常见的是蒸汽、环氧乙烷（EtO）气体等离子体（Sterrad）或过氧乙酸（Steris）消毒。
This can be accomplished through a number of different methods, but most commonly through steam, ethylene oxide(EtO), gas plasma (Sterrad), or peracetic acid (Steris) sterilization.
激光深熔焊中侧吹保护气体方法用于降低等离子体中的电子密度抑制等离子体，TIG中活性焊剂也有吸收电子的作用。
The method of blow, side protecting gas in laser deep welding is used to reduce the electronic density of plasma, also, the active flux in TIG can absorb electron.
在HL -1m装置上用分子束注入等离子体的气体加料方法提高了等离子体的电子密度。
Plasma electron density was increased by using the method of gas fuelling with molecular beam injection in the HL 1m tokamak.
推导了双混合气体和具有潘宁效应的双混合气体的放电等离子体电子温度的理论计算公式。
The formulas are derived for electron temperature in the plasma of a discharge for a binary mixture gas and a mixture gas possessing Penning effect.
推导了双混合气体和具有潘宁效应的双混合气体的放电等离子体电子温度的理论计算公式。
The formulas are derived for electron temperature in the plasma of a discharge for a binary mixture gas and a mixture gas possessing Penning effect.
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