摘要本文综述了国内外脉冲工艺在电弧离子镀和磁控溅射中的应用。
ABSTRACT the application of pulse technique on arc ion plating and magnetron sputtering is summarized in the article.
该系统集脉冲阴极弧离子镀、直流阴极弧离子镀、磁控溅射和电子束蒸发等镀膜工艺以及气体和金属离子注入于一体。
The system include pulse cathodic arc ion deposition, direct current cathodic arc ion deposition, magnetic sputtering and electronic beam evaporation technologies.
本文介绍了新型硬质涂层和硬质涂层沉积技术中电弧离子镀和磁控溅射镀技术的新进展。
Makes a survey about the recent develpment of new deposition techniques for hard thin film coatings.
本文介绍了新型硬质涂层和硬质涂层沉积技术中电弧离子镀和磁控溅射镀技术的新进展。
Makes a survey about the recent develpment of new deposition techniques for hard thin film coatings.
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