气体离化团束的高溅射产额可能是由于多体碰撞、侧向溅射及高能量密度的照射引起的。
The higher sputtering yield would result from multiple collision, lateral sputtering and high density energy deposition of gas cluster ion beam.
气体离化团束优良的平坦化和清洁化效果可能与照射中多体碰撞、侧向溅射及高能量密度的沉积相关。
The unique smoothing and cleaning effects of gas cluster ion beam wou1d result from multiple collision, lateral sputtering and high density energy deposition.
气体离化团束优良的平坦化和清洁化效果可能与照射中多体碰撞、侧向溅射及高能量密度的沉积相关。
The unique smoothing and cleaning effects of gas cluster ion beam wou1d result from multiple collision, lateral sputtering and high density energy deposition.
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