为实现电子束曝光机扫描场的线性畸变校正，设计了图形发生器的成像系统，该系统包括硬件和软件两部分。
An imaging system of pattern generator was designed to correct linear distortion of scanning field of ane-beam lithography system, which was composed of both hardware and software.
该图形发生器包括硬件和软件两部分。
The Patten Generator is composed of both hardware and software.
该图形发生器包括硬件和软件两部分。
The Patten Generator is composed of both hardware and software.
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