介绍了一种新的表面处理方法——激光触发真空电弧镀膜技术。
A novel technique as laser induced vacuum arc coating for surface modification and machining is reviewed in this paper.
介绍了阳极真空电弧镀膜方法的镀膜装置、工作原理及电弧等离子体微观过程。
The typical equipment, the basic principle and arc plasma process of anodic vacuum arc coating are presented.
分析了在外加磁场作用下，真空电弧镀膜中阴极靶面液池的受力情况，导出了液滴喷溅特性受磁场影响的关系式。
The forces applied on the molten pool at the cathode surface under the action of an external magnetic field during vacuum arc coating are analyzed.
在脉冲真空电弧离子镀膜过程中，膜层厚度的控制至关重要。
Its very important to control the thickness of the film in the process of the pulsed vacuum arc deposition (PVAD).
离子能量是影响脉冲真空电弧离子镀镀膜质量的一个重要参数，因而测量真空电弧中离子的能量非常重要。
Ion energy is an important parameter influencing the quality of films by pulsed vacuum arc ion deposition, so it is very necessary to measure the ion energy of pulsed arc.
介绍了一种新的镀膜技术—过滤式真空电弧离子镀膜技术。
A technique - filtered vacuum arc ion coating for thin film deposition-is reviewed in this paper.
在脉冲真空电弧离子镀膜过程中，膜层厚度的控制至关重要。
Mechanical and optical properties of titanium dioxide films prepared by pulsed bias arc ion plating;
在脉冲真空电弧离子镀膜过程中，膜层厚度的控制至关重要。
Mechanical and optical properties of titanium dioxide films prepared by pulsed bias arc ion plating;
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