光刻过程中由于光的衍射效应产生的非线性畸变对光刻面形质量具有严重影响,是造成光刻微结构图形失真的主要原因之一。
Nonlinear distortion caused by diffraction in the lithography process has severely affected the quality of surface profile, which is the main reason for pattern distortion in lithography.
光刻过程中由于光的衍射效应产生的非线性畸变对光刻面形质量具有严重影响,是造成光刻微结构图形失真的主要原因之一。
Nonlinear distortion caused by diffraction in the lithography process has severely affected the quality of surface profile, which is the main reason for pattern distortion in lithography.
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