电镀镍及镍合金的研究重点是采用新工艺技术改善镀层性能及电沉积机理的探讨。
The emphasis of research in electroplated ni and its alloy is to use a new technology to improve the capability of coating and to probe the mechanism of electrodeposition.
本研究旨在探讨硒酸钠在锌锰合金电沉积中的作用机理。
The purpose of this study was to discuss the mechanism of sodium selenate in electrodeposition of zinc-manganese alloy.
此外，还简单地介绍了电沉积非晶质合金的形成机理和用途。
In addition, the forming mechanism and the use of amorphous electrodeposited alloys are introduced briefly.
为探讨铝阳极氧化沉积铈转化膜形成机理，分别用化学沉积和电沉积法在铝阳极氧化膜上制备了铈转化膜。
Cerium conversion films were prepared on anodized aluminum via chemical deposition and electrodeposition respectively, and the mechanisms of formation of the cerium conversion films were investigated.
探讨了超声—电沉积复合作用的机理，总结出影响复合镀层生成的几个因素。
The mechanism of the compound effects of ultrasonic-electrodeposition was discussed, and several factors that have effected on the formation of the composite layer were concluded.
此外，还简单地介绍了电沉积非晶质合金的形成机理和用途。
In addition, the forming mechanism and the use of amorphous electrodeposited alloys are introduced...
论述了现代碱性光亮镀锌添加剂单体结构的新进展及对锌电沉积过程的作用机理。
New development of brighteners for alkaline zinc plating is reviewed with stresses on the advances in structure of monomers.
本文旨在探讨硒酸钠提高锌锰合金电沉积电流效率的机理。
The purpose of this study was to disclose the mechanism of sodium selenate in electrodeposition of zinc-manganese alloy.
综述了铜在芯片微刻槽中电沉积填充的过程、机理 ，并着重讨论了实现无裂缝和无空洞理想填充的主要因素—镀液的组成和添加剂的影响。
The procedure and mechanism of copper filling in the trench of the chip are reviewed, the effect of electrolyte components and additives on superfilling are discussed.
介绍了铝合金型材阳极电泳机理，以及如何获得合适的电沉积量。
Anodic electrophoretic mechanism of aluminum alloy profile and how to obtain suitable deposition amount of electrophoretic coating are introduced in the paper.
研究功率超声在纳米电沉积技术中的作用机理。
The mechanism of applications of high intensity ultrasonic in the nano composite electrodepositing was expatiated on the base of experiment.
利用脉冲电沉积法制备了掺钴氧化钨电致变色薄膜，并探讨了该方法的机理。
WO_3 electrochromic thin films doped with Co were prepared by pulsed electrodeposition, and the mechanism of this method was also explored.
利用脉冲电沉积法制备了掺钴氧化钨电致变色薄膜，并探讨了该方法的机理。
WO_3 electrochromic thin films doped with Co were prepared by pulsed electrodeposition, and the mechanism of this method was also explored.
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