研究了处理时间、气体流量和电极偏压对增塑剂渗出量的影响。
The influence of treatment time, gas flow rate and bias voltage on the plasticizer leaching was investigated.
亲水性的改善程度随处理时间和电极偏压的增加而变好，但随气体流量的增加而变差。
The improvement in hydrophilicity of the inner surface were enhanced with increasing treatment time and bias voltage, while were decreased with increasing the gas flow rate.
在薄膜沉积和离子束刻蚀技术中，通常要给绝缘基片加上一个射频或脉冲电极，以便在绝缘基片上形成一个自偏压来控制轰击到绝缘基片表面的离子能量。
Self-bias voltage of the dielectric substrate surface and voltage of the driven electrode were experimentally studied to improve the energy control of impinging ion in plasma processes.
通过非晶硒层偏压电极加速从捕获能量X射线曝光。
The bias electrode accelerates the captured energy from an X-ray exposure through the amorphous selenium layer.
采用调节射频电感性耦合等离子体中基片电极与地之间的外部电路阻抗的方法，控制基片电极的射频自偏压。
The RF self-bias of the substrate in an RF inductively coupled plasma is controlled by changing the impedance of an external circuit inserted between the substrate and the ground.
采用调节射频电感性耦合等离子体中基片电极与地之间的外部电路阻抗的方法，控制基片电极的射频自偏压。
The RF self-bias of the substrate in an RF inductively coupled plasma is controlled by changing the impedance of an external circuit inserted between the substrate and the ground.
应用推荐