介绍了一种新的镀膜技术—过滤式真空电弧离子镀膜技术。
A technique - filtered vacuum arc ion coating for thin film deposition-is reviewed in this paper.
在脉冲真空电弧离子镀膜过程中，膜层厚度的控制至关重要。
Its very important to control the thickness of the film in the process of the pulsed vacuum arc deposition (PVAD).
在脉冲真空电弧离子镀膜过程中，膜层厚度的控制至关重要。
Mechanical and optical properties of titanium dioxide films prepared by pulsed bias arc ion plating;
采用电弧离子镀膜方法，以高纯石墨为碳离子源在PM MA树脂义齿表面沉积类金刚石膜。
By the technology of vacuum cathodic arc deposition, graphite as cathode, Diamond like carbon film (DLC) was deposited on PMMA resin denture.
通过对靶座结构的改变，使得靶面不再存在其他材质，由此提高了电弧离子镀膜膜层的纯度。
The construction of the target holder was changed so as to keep no other materials included in target surface, thus improving the purity of the films prepared by arc discharge deposition.
一种新的镀膜技术——电弧放电离子镀研制成功。
A new coating technology, arc discharge ion plating has been developed.
离子能量是影响脉冲真空电弧离子镀镀膜质量的一个重要参数，因而测量真空电弧中离子的能量非常重要。
Ion energy is an important parameter influencing the quality of films by pulsed vacuum arc ion deposition, so it is very necessary to measure the ion energy of pulsed arc.
ZX G型离子沉积电弧蒸发电源装置，专门用于多弧离子镀膜机的电弧蒸发。
Power in ion deposition arc evaporating unit, type ZXG is specially used for the arc evaporation of multi-arc ion coating equipment.
所设计的冷电弧阴极在用于全金属结构氩离子激光器和离子镀膜装置中时，均取得成功结果。
The cathode has been successfully applied to an all-metal argon are laser and anion plating equipment.
所设计的冷电弧阴极在用于全金属结构氩离子激光器和离子镀膜装置中时，均取得成功结果。
The cathode has been successfully applied to an all-metal argon are laser and anion plating equipment.
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