利用电子束曝光机完成有关邻近效应的实验。
The proximity effect in the E-beam lithography system was verified by experiments.
可变矩形电子束曝光机的基本曝光图形是矩形。
The elementary exposure pattern of a variable rectangular electron beamexposure machine is a rectangle.
可变矩形电子束曝光机的基本曝光图形是矩形。
The elementary exposure pattern of a variable rectangular electron beam exposure machine is a rectangle.
电子束曝光机的偏转系统控制电子束偏转扫描。
The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam.
本文介绍一种电子束曝光机用新型精密高压电源。
A new type high accuracy high voltage D. C. power supply used for electron beam exposure sysfem is described.
利用SDS - 3电子束曝光机完成有关邻近效应的试验。
The proximity effect in the SDS-3 E-beam lithography system is verified by experiments.
本文介绍了电子束曝光机激光定位工作台的一种新型吊装结构。
In this paper, a unique hoisting structure of laser positioning stage system for electron-beam lithography machine is described.
正在研制的激光定位吊装结构工作台系统是电子束曝光机的主要组成部分。
The laser Positioning stage system with hoisting structure which is being developed is the main part of the Electron - beam Lithography Machine.
DY 2001a型电子束曝光机是作为实用化的小型曝光系统而研制的。
DY2001A Electron Beam Lithography System (EBLS) is developed as a practical miniature EBLS.
本文简要地介绍了一种圆形电子束曝光机应用软件的结构、工作原理及工作过程；
The composition, principle and working procedure of the application software of EBES-40A electron beam Lithography system are introduced.
本文总结了用于可变矩形电子束曝光机激光定位工件台电控系统的研制及实验经验。
The development and experiments of electronic controlling system for variable rectangular E-beam lithography and lasser positioning stage are summed in the paper.
本文简要介绍了一种矩形电子束曝光机图形转换软件的结构、工作原理和工作过程。
This paper presents a kind of data conversion software used in the variable-shaped e-beam lithography, especially on its composition, working theory and working procedure.
由SDS-3电子束曝光机试验结果表明，复合静电偏转可以达到磁偏转相似的像差水平。
The experimental results of SDS-3 Ebeam lithography machine show that the aberrations of the electrostatic deflection are in the same order of the magnetic deflection.
文中还对各种类型的电子束曝光机进行了比较，并报导了电子束曝光在其它领域的应用情况。
Here also compares various versions of EBL machine and reports the application of EBL in other field.
电子束曝光机版图切割过程中可能出现带内孔的多边形，并且多边形内环与外环之间可能发生重叠。
During the layerout cutting process for thee beam lithography system, some polygons with one or more inner holes may appear.
根据平面区域变换的原理，导出电子束曝光机扫描场的畸变校正函数，并给出计算机模拟校正的结果。
A scan field distortion correction function fore-beam exposure system is deduced on the basis of the plane field alternation principle, and a simulative fruit is given by computer.
在与各种探测器比较的基础上，我们设计了微通道板探测器，它是目前用于电子束曝光机的最先进的探测器。
On basis of comparison with other types of detectors, we designed microchannel plate detector which is the most advanced detector for EBM up to now.
为实现电子束曝光机扫描场的线性畸变校正，设计了图形发生器的成像系统，该系统包括硬件和软件两部分。
An imaging system of pattern generator was designed to correct linear distortion of scanning field of ane-beam lithography system, which was composed of both hardware and software.
以SDS - 3电子束曝光机为基础，用折板结构静电偏转替代直板结构静电偏转，探讨了电子束曝光机折板静电偏转场的电子轨迹与电位分布应满足的要求。
Based on the SDS-3 E-beam lithography machine, the electrostatic deflection of the folded plate structure was used instead of the electrostatic deflection of the plate.
研究了电子束曝光机图形数据格式转换软件的分割、压缩算法 ，针对传统的图形数据分割、压缩算法存在的主要缺点 ，提出了新的分割算法和压缩算法 ，并对压缩算法进行了详细的论述和研究。
The paper, by using the transform characteristic of wavelet, mainly studies the method for image data compression in order to search for the new way of high proportion, high quality image compression.
研究了电子束曝光机图形数据格式转换软件的分割、压缩算法 ，针对传统的图形数据分割、压缩算法存在的主要缺点 ，提出了新的分割算法和压缩算法 ，并对压缩算法进行了详细的论述和研究。
The paper, by using the transform characteristic of wavelet, mainly studies the method for image data compression in order to search for the new way of high proportion, high quality image compression.
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