掩模制作是电子束散射角限制投影光刻(SCALPEL)的关键技术。
Mask fabrication is a key technique of scattering with angular limitation projection electron-beam lithography (SCALPEL).
此外，用此方法提取的电子散射参数被成功地用于相同实验条件下的电子束临近效应校正。
Furthermore, the parameters acquired by this method are successfully used for proximity effect correction in electron beam lithography on the same experimental conditions.
使用相对论性强激光与电子束对撞中产生的辐射研究非线性康普顿散射是粒子物理与强激光物理两个领域的交叉前沿课题。
Using the collision of relativistic laser and electron beam to study the nonlinear Compton scattering is the interdisciplinary frontier of particle physics and strong laser physics.
本文介绍了低能电子在固体中的弹性散射和非弹性散射，及其在电子束显微分析中的一些应用。
The elastic and inelastic scattering of low energy electrons in solids and some of its applications in electron beam microanalysis are described.
利用电子束的弗拉索夫分布函数理论和三维波导模的波动方程求得在康普顿区域中的散射波色散关系。
By making use of the Vlasov distribution theory and the three dimensional wave equation of waveguide modes, the dispersion relation of scattered waves in Compton region is deduced.
得到了散射电子在电子束胶层中背散射与前散射的能量沉积分布图。
The graphs of the forward scattering energy deposition and backscattering energy deposition have been given.
得到了散射电子在电子束胶层中背散射与前散射的能量沉积分布图。
The graphs of the forward scattering energy deposition and backscattering energy deposition have been given.
应用推荐