因此目前电子束光刻设备主要的用途是用于刻制掩膜板，许多人甚至认为电子束光刻技术的产出量永远也无法满足芯片量产的需求。

E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography.

youdao

因此目前电子束光刻设备主要的用途是用于刻制掩膜板，许多人甚至认为电子束光刻技术的产出量永远也无法满足芯片量产的需求。

E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography.

youdao