采用新型的多层抗蚀剂结构的电子束光刻来形成图形。

Electron - beam lithography with a novel multilevel resist structure defines the pattern.

youdao

采用新型的多层抗蚀剂结构的电子束光刻来形成图形。

Electron - beam lithography with a novel multilevel resist structure defines the pattern.

youdao