介绍了以DX -3扫描电镜为基础，利用SDS -2电子束扫描系统改装其偏转系统。
The deflection system of DX 3 has been rebuilt with SDS 2 system.
为实现电子束曝光机扫描场的线性畸变校正，设计了图形发生器的成像系统，该系统包括硬件和软件两部分。
An imaging system of pattern generator was designed to correct linear distortion of scanning field of ane-beam lithography system, which was composed of both hardware and software.
利用该系统可对电子束扫描轨迹、扫描频率以及加热区域电子束能量密度的分配进行离线编辑和在线调节。
The EB scanning track, scanning frequency and energy density distribution at heating zone could be programmed off-line and adjusted on-line.
电子束曝光机的偏转系统控制电子束偏转扫描。
The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam.
电子束曝光机的偏转系统控制电子束偏转扫描。
The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam.
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