主发电机的开环时间常数会对建压过冲产生影响，而输出直流电压的上升速度也是一个重要因素。
The open loop time constant of the main generator influence the overshooting evidently. The important factor is the rising speed of the output DC voltage.
前者包括反应自由焓、平衡常数、最大产量、气相分压以及熔盐电解理论分解电压的计算；
The former includes the calculation of reaction free enthalpy, equilibrium constants, maximum output, gaseous phase partial pressure and theoretical decomposition voltage of molten salt electrolysis.
借助磁通反馈环节控制磁化电流扫描速度，使得产生的感应电压接近常数。
With the help of the sweeping velocity of magnetizing current controlled by a flux feedback loop a nearly constant induced voltage is produced.
运用半导体的PN结扩散电流与电压关系特性，精确地测量了玻尔兹曼常数。
Based on the relationship between the diffusion current and voltage of PN junction, the Boltzmann's constant is measured with high accuracy.
结果表明，采取粉料埋烧可以明显降低压敏电压、提高介电常数。
The result showed that burying sintering process may make breakdown voltage smaller and apparent dielectric constant bigger.
根据普朗克定律，推导出仪器的输出电压是扩展源辐射亮度的单调增函数和常数的乘积。
Based on the Planck principle, it is deduced that the BIIR output voltage is the product of a constant and a monotonic increasing function of radiation luminance from the extended sources.
本文简单介绍了光电效应测普朗克常数实验的基本原理及测量截止电压的三种方法。
The paper introduced the method of measuring Plank's constant by determining the cut-off voltage in photoelectric effect experiment.
在将表面产生速度看作常数的条件下，本文导出了MOS结构对阶跃电压瞬态响应曲线的解析表达式。
In this paper an analytical expression of the ct transient response curve of a MOS structure has been derived under the condition that the surface generation rate can be regarded a constant.
计数值除以一个常数得到输入电压的线性显示。
Dividing the ADC count by a constant yields a linear display of the input voltage.
介绍了光电效应实验中通过确定截止电压测量普朗克常数的方法，并分析了实验中产生误差的原因，指出减小误差的方法。
This paper briefly introduces the basic principles to measure plancks constant by photoemission and the three methods to measure cut-off voltage.
X射线衍射仪、电子能谱仪、原子力显微镜和椭圆偏振仪等研究薄膜的击穿电压、介电常数、晶体结构、化学成分、表面形貌及薄膜的折射率。
The breakdown voltage, permittivity, crystal structure, composition, surface and refractive index of the thin films were studied by I-V, C-V, XRD, EDS, AFM and elliptical polarization instrument.
X射线衍射仪、电子能谱仪、原子力显微镜和椭圆偏振仪等研究薄膜的击穿电压、介电常数、晶体结构、化学成分、表面形貌及薄膜的折射率。
The breakdown voltage, permittivity, crystal structure, composition, surface and refractive index of the thin films were studied by I-V, C-V, XRD, EDS, AFM and elliptical polarization instrument.
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