以SDS - 3电子束曝光机为基础，用折板结构静电偏转替代直板结构静电偏转，探讨了电子束曝光机折板静电偏转场的电子轨迹与电位分布应满足的要求。

Based on the SDS-3 E-beam lithography machine, the electrostatic deflection of the folded plate structure was used instead of the electrostatic deflection of the plate.

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国外研究对韵脚意识的事件相关电位（ERP）中的负向偏转（CNV）成分存在不同看法，但对N400成分看法较为一致；

The foreign researches have different viewpoints about the CNV composition in ERPs of rhythm awareness, but have more consistence about the N400 composition.

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另外，附加电极的引入也为降低加速阳极电位和偏转电极电位从而提高偏转系统的灵敏度提供了一定的空间。

And also, the possibility of lowering the potentials of accelerating anode and deflecting plate is largely enhanced by the modification to the optical system.

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另外，附加电极的引入也为降低加速阳极电位和偏转电极电位从而提高偏转系统的灵敏度提供了一定的空间。

And also, the possibility of lowering the potentials of accelerating anode and deflecting plate is largely enhanced by the modification to the optical system.

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