简要概述了脉冲激光蒸发淀积(PLED)和激光诱导化学气相淀积(LCVD)的基本原理、淀积系统和激光器。
The basic principles, deposition systems and laser sources of pulsed laser evaporation deposition (PLED) and laser-induced chemical vapor deposition (LCVD) are simply introduce.
简要概述了脉冲激光蒸发淀积(PLED)和激光诱导化学气相淀积(LCVD)的基本原理、淀积系统和激光器。
The basic principles, deposition systems and laser sources of pulsed laser evaporation deposition (PLED) and laser-induced chemical vapor deposition (LCVD) are simply introduce.
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