通过溅射的真空蒸发镀膜使超薄切片机上使用的玻璃刀口上带有一层钨膜。
Glass knives for ultramicrotome were improved by sputter and evaporating coating cut-ting dege with a film of tungsten.
磁控溅射技术在薄膜制备领域的应用十分广泛，而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。
Magnetron Sputtering Technology has been applied in the field of film preparing widely, however, the quality of the film is influenced by stability of target current badly.
磁控溅射技术在薄膜制备领域的应用十分广泛，而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。
Magnetron sputtering process has widely been applied to thin film preparation, during which, the quality of thin film is affected badly by the current stability of target.
侧重于从溅射原子的沉积过程来分析边缘效应对膜层横向均匀性的影响。
The influence that the marginal effect ACTS on the horizontal uniformity of the film is analysed through the depositing procedure of sputtering atom.
沿垂直膜面俄歇电子（AES）逐层分析证明，优化溅射工艺制备的薄膜化学成分分布均匀。
The results of AES analyses proved that the optimized composition is uniform along the cross-sections of the film.
沿垂直膜面俄歇电子（AES）逐层分析证明，优化溅射工艺制备的薄膜化学成分分布均匀。
The results of AES analyses proved that the optimized composition is uniform along the cross-sections of the film.
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