设计了一种新的紫外或深紫外光刻物镜。
The design of a new kind of UV or DUV lithography lenses is described in this paper.
深紫外激光光源在工业和科研方面具有广泛的应用。
Deep ultraviolet lasers have various applications in industries and scientific researches.
通过深紫外光刻和感应耦合等离子刻蚀设备，制备了所设计的器件。
The designed SOI nanowire AWGs were fabricated using ultraviolet lithography and induced coupler plasma etching.
利用光电效应的原理，我们用深紫外光照射样品，并探测出射的光电子（图一）。
Based on the photoelectric effect, when a beam of monochromatized radiation is shined on a sample, electrons are emitted and escape to the vacuum (Fig. 1).
利用光电效应的原理，我们用深紫外光照射样品，并探测出射的光电子（图一）。
Based on the photoelectric effect, when a beam of monochromatized radiation is shined on a sample, electrons are emitted and escape to the vacuum (Fig. 1).
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