研制了一套过滤式阴极电弧沉积设备，并利用该设备成功地获得了类金刚石薄膜。
The instrument of filtered cathode arc deposition is successfully built in our laboratory. Diamond-like carbon film is maded.
该电沉积设备体积较小、操作方便、造价低廉、性能稳定、精确度高，完全满足电沉积薄膜温差电材料的需要。
The device is small in size, easy to operate, cheap, reliable, accurate, and it fulfills the need of electrodeposition of thin film TE material.
采砂船上不仅有挖斗，而且还有冲砂和分选设备，以使较重的有用矿粒因重力而沉积。
The dredges not only have scoops but also devices for washing sand or gravel and screening it so that gravity settles the heavier and more valuable particles.
使用电极栅使粉末充电并沉积在接地的工件上的一种流化床设备。
A fluid bed equipped with an electrode grid to charge powder so that it is deposited on an earthed component.
本研究自行设计制作了激光诱导化学气相沉积(LICVD)纳米硅粉制备设备，并对关键部件的设计思路进行了阐述。
In this study we designed and made the preparation equipment of nano-silicon powder by LICVD (laser induced chemical vapor deposition), and introduced the designing thought of key parts.
快速成型技术中的熔融沉积造型(FDM)工艺由于设备费用较低、材料利用率较高而在实际生产中得到广泛的应用。
Fused Deposition Modeling (FDM) in rapid prototyping technology is widely applied in industry because of its lower expense of equipment and lower consumption of materials.
采用国内研制的电子回旋共振化学气相沉积(ECRCVD)设备，在单晶硅衬底上沉积了金刚石薄膜。
Diamond thin films were successfully deposited on single - crystal si substrate at low pressure by a homemade equipment of electron cyclotron resonance chemical vapor deposition (ECRCVD).
分析湿法磷酸过滤设备与管道结垢的主要原因是氟硅酸钾、钠盐因磷酸液相温度下降而沉积下来。
The scaling on equipment and pipeline of WPA filtration unit is caused by the precipitation of potassium and sodium fluosilicate when the temperature of acid decreases.
探讨如何用电子回旋共振化学气相沉积(ECRCVD)设备制备非晶态氮化硅介质膜和光学膜。
This article is about how to use Electron Cyclotron Resonance Chemical Vapor Deposition (ECRCVD) method to prepare amorphous silicon nitride (SiN_x) film.
MOCVD是金属有机物化学气相沉积技术的简称，即通过MOCVD设备，在衬底上生长材料晶体的一种方法。
MOCVD is an abbreviation form for Metal Organic Chemical Vapor Deposition, which is a method used to grow material crystal on substrate via MOCVD device.
运行结果表明，改进后的设备体积小，电沉积时间短，操作简单，钢棉吸附金的容量高。
The results indicate that the improved equipment has (advantages) of small volume, short time for electrodepositing, easy operation and high content for gold enclosed in steel wool.
介绍了真空气相沉积法制备聚对二甲苯薄膜的实验设备、实验原理和实验方法。
The paper focuses on vacuum vapor deposition for making parylene film which is used in many targets. The experiment facility and principle are described too.
MOCVD是金属有机化学气相沉积技术的简称，即通过MOCVD设备，在衬底上生长材料晶体的一种方法。
MOCVD stands for Metalorganic Chemical Vapor Deposition, is one technology used to grow wafers from underlay with the MOCVD equipment.
利用微波等离子体化学气相沉积(CVD)设备，在硅基片上进行了金刚石薄膜的沉积实验。
The experiment of the deposition of diamond thin films is made on silicon substrate by using microwave plasma chemical vapor deposition (CVD) system.
介绍了独联体国家难熔金属氟化物化学气相沉积的工艺、设备及其产品的开发情况和研究进展。
This paper reviews fluorides CVD methods for refractory metals in CIS countries, including modern development of the equipment and products.
利用热灯丝dc等离子体沉积使金刚石成核和生长的方法和设备。
A method and apparatus for nucleation and growth of diamond by hot-filament DC plasma deposition.
通过现场试验数据分析，在线清洗可以去除锅炉设备内表面的沉积物，达到清洁锅炉的目的。
In situ test data show the deposition on the inter-surface of boiler equipment can be removed and can get a clean inter-surface of boiler by online cleaning way.
电化学沉积薄膜技术工艺设备简单成本低，在半导体薄膜制备方面有很好的应用前景。
Electrochemical deposition is of simple and low cost method, displaying a potential application in the deposition of semiconductor films.
为避免结晶沉积堵塞，对固体亚硫酸铵生产装置提出集中布置设备的原则。
The principle of compact arrangement of the equipment is proposed to avoid build-up of crystal.
火力发电机组的凝结水精处理系统中常出现树脂泄漏现象，使水汽的品质恶化，造成凝结水中杂质在水冷壁等设备上沉积，引起设备管路的腐蚀，影响发电设备的正常运行。
Recently, resin leakage often occurs in condensate polishing system of fossil power unit, which has deteriorated the water vapour, corroded the pipeline and affected the operation of the equipment.
北京一半导体公司急聘一名化学气相沉积(CVD)设备工程师，待遇从优。
A semiconductor company based in Beijing is in need of a Chemical Vapor Deposition (CVD) equipment Engineer with very competitive salary and other benefits.
高温下电沉积制备稀土铥及其合金的设备易腐蚀、能耗大。
Corrosion of equipment and high energy - loss usually exist in the production of rare earth Tmand its alloys by electrodepositing under high temperature.
本发明的化学气相沉积室的清洁方法，可以代替湿法清洁方法实现对沉积室的全面清洁，操作方便、快捷，并可减少设备的闲置时间，提高生产效率。
The method can substitute a wet cleaning method to clean completely the deposition chamber, is easy and rapid to operate, can reduce the idle time of equipment and improve the productivity.
本发明提供具有界定在基板支撑组件与气体分配板之间的梯度间隔，且用于沉积供太阳能电池应用的硅薄膜的设备及方法。
Methods and apparatus having a gradient spacing created between a substrate support assembly and a gas distribution plate for depositing a silicon film for solar cell applications are provided.
沉积物可以很明显地看到光谱特性和高光谱分辨率的设备，将被定义为跟进的探索。
The deposit can clearly be seen spectrally and with the resolution of this hyperspectral equipment, will be defined for follow up exploration.
结果表明，使用RIPP- 1 42 1油浆阻垢剂能减轻分馏塔和油浆系统结垢，阻止污垢在设备上的沉积，可大大延长运转周期；
The results showed that RIPP 1421 was better than the original used antifoulants. It can lighten the fouling in fractionator and slurry system, and extend the run cycle.
装置碱洗、物料沉积导致有害离子浓缩及设备存在残余拉应力是造成腐蚀开裂的主要原因。
It has been found out that the major culprits for the corrosion cracking are the concentration of harmful ions from caustic wash and material settlement and residue tension strain.
装置碱洗、物料沉积导致有害离子浓缩及设备存在残余拉应力是造成腐蚀开裂的主要原因。
It has been found out that the major culprits for the corrosion cracking are the concentration of harmful ions from caustic wash and material settlement and residue tension strain.
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