进行了氧氯化铜防治柑桔溃疡病的药效试验。
The control effect of copper oxychloride on citrus canker was studied.
研究了用溶剂萃取法从氯化铜溶液中去除钴。
Removal of cobalt from copper chloride solution by solvent extraction with P204 is studied.
氯化铜二水合物；
试剂级氯化镉，氯化铜，硫酸锌和使用进行的所有研究。
Reagent-grade cadmium chloride, copper chloride, and zinc sulfate were used to conduct all studies.
以氯化铜水溶液作电解液，在发光多孔硅薄膜表面上电沉积铜。
Microcrystals of metallic copper were electrochemically deposited onto the surface of porous silicon films in the aqueous electrolyte of copper(II) chloride.
本试验研究了碱式氯化铜(TBCC)对断奶仔猪的促生长效应。
An experiment was conducted to investigate the growth promotion effects of tribasic copper chloride (TBCC) for weanling piglets.
三羟基氯化铜有三个常见的异构体，氯铜矿、斜氯铜矿和副氯铜矿。
The copper trihydroxychloride has three isomers, namely atacamite, botallackite and paratacamite.
氯化铜，硫酸钡是诚实的，它们没有丢掉氯化钡，硫酸铜一一个分子，只是改变了其形式。
Copper chloride, barium sulfate is honest, they do not lose barium chloride, copper sulfate 11 molecule, but only changed its form.
通过研究，作者发现氯化铜在铝板机器名牌腐蚀液中所起的重要作用，从而提出改进原腐蚀液配方的可能性。
Through the study, the researchers found the importance of copper chloride in corrosion solution of aluminium machine nameplate and proposed the possibility of improving the formula of original c...
运用络合平衡和沉淀平衡的理论，对酸性氯化铜蚀刻液的蚀刻过程进行研究，提出以铜废料作还原剂，回收蚀刻液中铜。
Based on application of theories of complexing and precipitation equilibriums and study of etching process using acidic copper chloride etching soln. , a new method of recovering Cu in etching soln.
以邻三氟甲基苯胺为起始原料，二水氯化铜为催化剂，盐酸-双氧水为氯化剂，合成4 -氯- 2 -三氟甲基苯胺。
4-chloro-2-trifluoromethyl aniline was synthesized from 2-trifluoromethyl aniline, using hydrochloric acid-hydrogen peroxide as the chlorination agent and cupric chloride as the catalyst.
结果表明：四氯化钛对总氮的脱除率为80％左右，碱氮的脱除率可达90％以上； 二氯化铜对碱性含氮化合物的络合具有较高的选择性；
The results show that the removal of nitrogen compounds by TiCl 4 complexing is about 80%, and 90% for that of basic nitrogen compounds.
结果表明：四氯化钛对总氮的脱除率为80％左右，碱氮的脱除率可达90％以上； 二氯化铜对碱性含氮化合物的络合具有较高的选择性；
The results show that the removal of nitrogen compounds by TiCl 4 complexing is about 80%, and 90% for that of basic nitrogen compounds.
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