1986年，我们共同设计制造程序自动控制真空氮化设备和研究真空脉冲氮化工艺。
In 1986 we designed the procedure auto-control vacuum nitriding furnace and studied the pulse vacuum nitriding processes.
目前LED同硅晶片的制作设备类似，都是通过在蓝宝石衬底片上沉淀氮化镓层实现。
At present these LEDs are made in machines similar to those used to make silicon chips, by depositing layers of gallium nitride on sapphire-based wafers.
该设备采用氮化钛表面掺金技术，形成离子金膜层，耐磨性非常好，广泛用于各种高档装饰膜层。
This equipment adopts the titanium nitride metal mixing techs forming ion gold membrane with good abrasion resistance, therefore it fits for various top-grade decorating membrane.
主要阐述了采用自制新型水介质等离子弧设备对氮化硅陶瓷材料进行加热辅助切削的试验条件及过程。
This paper introduces the experiment condition and process to carry out hot cutting on silicon nitride ceramics materials with new self-made water-plasma arc equipment.
介绍了侧链氯化、氧化、重氮化和偶合的工艺及设备。
The technology and equipment for the process of side-chain chlorination, oxidation, diazotization and coupling are introduced.
LDMC系列离子渗氮(氮化)设备由LD、LDMC系统电源和真空炉体构成。
LD, LDMC series Ion nitrogen (NOx) equipment from the LD, LDMC system power vacuum furnace and pose.
氮化硅厂拥有国内先进的氮化硅烧结设备。
The azotized silicon factory possesses the domestic advanced azotized silicon sintering equipments.
对称重氮化合物，含有它们的组合物，染色方法和设备。
Symmetrical diazo compounds, compositions comprising them, method of coloring, and device.
探讨如何用电子回旋共振化学气相沉积(ECRCVD)设备制备非晶态氮化硅介质膜和光学膜。
This article is about how to use Electron Cyclotron Resonance Chemical Vapor Deposition (ECRCVD) method to prepare amorphous silicon nitride (SiN_x) film.
在托马斯教授看来，今天又出现了新的问题，那就是能源。他说：“我们认为氮化镓能够像硅材料解决计算机信息储存量问题一样，解决现在的设备的耗能问题。”
"Today's challenge is energy," says Palacios, "and we believe that gallium nitride can be just as important in addressing the energy challenge as silicon was in addressing the information challenge."
本发明公开了一种能够制备无裂的氮化物半导体自支撑衬底的方法及其专 用设备。
The invention discloses a method for preparing a self-supporting substrate of a flawless nitride semiconductor and specific device thereof.
本文对辉光离子氮化的设备、工艺原理和生产应用作了简单的介绍。
This paper gives a brief account of glow ion-nitriding-equipment, fundamentals and application.
采用金相组织分析、显微硬度测试以及普通辉光离子氮化炉等方法和设备 ，研究经不同方式预处理的氨气对离子氮化速度和氮化层组织的影响。
The structure and property of 40Cr steel ion?nitrided layer in the different nitrided atmosphere were investigated by means of Ion Microprobe, XRD, Microscope Analysis and so on.
采用金相组织分析、显微硬度测试以及普通辉光离子氮化炉等方法和设备 ，研究经不同方式预处理的氨气对离子氮化速度和氮化层组织的影响。
The structure and property of 40Cr steel ion?nitrided layer in the different nitrided atmosphere were investigated by means of Ion Microprobe, XRD, Microscope Analysis and so on.
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