激光诱导气相沉积法是制备纳米氮化硅粉末的主要方法之一。
Laser induced chemical vapor deposition is the main method among the methods of fabricating nano Si3N4.
粉末压型烧结氮化硅样中氮和氧难以完全释放，其主要原因为烧结氮化硅样与粉末氮化硅样释放动力学条件不同。
The nitrogen and oxygen in sintered block Si 3N 4 can not release so completely as the powder sample at the same heating and extracting condition.
粉末压型烧结氮化硅样中氮和氧难以完全释放，其主要原因为烧结氮化硅样与粉末氮化硅样释放动力学条件不同。
The nitrogen and oxygen in sintered block Si 3N 4 can not release so completely as the powder sample at the same heating and extracting condition.
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