研究了氧气含量、薄膜缺陷、基底粗糙度等因素对氧化钽电学性能的影响。
The electrical properties as the function of oxygen percentage, defects in the films, and the roughness of the substrate surface were investigated.
研究了氧气含量、薄膜缺陷、基底粗糙度等因素对氧化钽电学性能的影响。
The electrical properties as the function of oxygen percentage, defects in the films, and the roughness of the substrate surface were investigated.
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