例如，如图8a所示，氧化层810选择性地在硅衬底820上形成图案。

For example, as shown in FIG. 8a, an oxide layer 810 optionally is patterned on a silicon substrate 820.

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例如，如图8a所示，氧化层810选择性地在硅衬底820上形成图案。

For example, as shown in FIG. 8a, an oxide layer 810 optionally is patterned on a silicon substrate 820.

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